Scia Systems – PEVCD/RIE Systems – scia Cube 300/750

  • FRANCE

    Emmanuel Milan, Product Manager

    DKSH Technology
    1475 Quai du Rhone
    01702 Miribel
    France

    +33 4 7855 7860

    +33 6 5037 8582

    Email

The scia Cube 300/750 are designed for large area high density plasma processes of substrates up to 300 mm x 200 mm (scia Coat 300) and up to 750 mm x 750 mm (scia Coat 750). Typical applications are deposition of Diamond Like Carbon (DLC) for optical filters and dielectric films for anti-reflective coatings as well as etching processes with oxygen or halogen chemistry for the structuring of Semiconductors and metals.

 

The scia Cube 300/750 combine plasma excitation by an array of microwave sources. The substrate stage is equipped with an independent a RF bias. Various substrate sizes can be transferred with an automatic vacuum load-lock system.

Technical Specifications

scia Cube 300scia Cube 750
Substrate sizeUp to 300 mm x 200 mmUp to 750 mm x 750 mm
Substrate holderWater cooled, RF biasWater cooled, RF bias
Substrate temperatureAlternatively cryo cooling down to -10°C or heating up to max. 700°CAlternatively cryo cooling down to -10°C or heating up to max. 850°C
Plasma sourceLinear microwave ECR-source PL400 and/or RF parallel plateLinear microwave ECR-source PL1300 and/or RF parallel plate arrangement
Power supplyMW-Power: max. 9000 W
RF-Power:max. 600 W
MW-Power: max. 48 kW, RF-Power: max. 3 kW
Base Pressure< 1 x 10-6 mbar< 1 x 10-6 mbar
System dimensions (W x D x H)1.90 m x 1.30 m x 2.20 m (without electrical rack and pumps)3.70 m x 3.40 m x 2.20 m (without electrical rack, pumps and loading system)
Tool configurations1 process chamber, 1 load-lock1 process chamber, 1 loading system, 1 load-lock
Software interfaceSECS II / GEMSECS II / GEM

Key Industries

  • Semiconductor, Solar & Electronics

Brand

Scia Systems

Manufacturer of advanced ion beam and plasma processing systems, scia Systems established itself in a very short time on the worldwide market. Products are dedicated to the industry of Microelectronics, MEMS and precision optical manufacturing : etching, trimming, sputtering systems.

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